At a glance
| Booth | L0017 |
| Country | TW |
| Website | www.wpic.com.tw |
Company profile
Wisdom Power International Corporation LTD (WPIC) focuses on sales and services for semiconductor plasma-generation and plasma-power equipment and provides technical support and complete plasma-system solutions to semiconductor customers. The company states that it has expertise in semiconductor manufacturing processes and plasma applications, innovative R&D capability and multiple patents based on plasma-application technology. WPIC's advanced Arcing detection and control technology is applied to yield improvement for 8-inch and 12-inch Etching, CVD and PVD processes. Its service scope includes semiconductor RF plasma-power monitoring, semiconductor plasma-chamber monitoring and remote-plasma technology for PECVD chamber cleaning. The listed services also include PVD-process Arc monitoring, semiconductor RF matcher optimization and fault detection, localization and improvement projects for key semiconductor components, and Optical endpoint detector refurbishment and maintenance for Monochromator, H.O.T Pack and Endpoint PC systems. WPIC also describes its business as the sales, maintenance and performance upgrading of semiconductor plasma power systems. It supplies advanced power modules and engineering technical services intended to help global wafer fabs extend equipment life, reduce energy consumption and improve process stability. When original-equipment support stops or maintenance cost becomes too high, the company offers alternatives ranging from routine maintenance to high-efficiency energy-saving module upgrades so customers can optimize existing assets without replacing the complete equipment set. The company states that its solutions can reduce total cost of ownership (TCO), save 20–80% of electricity consumption and improve system availability and process stability. WPIC reports research collaboration with Virginia Tech, National Chiao Tung University (NCTU) and National Formosa University (NFU) on next-generation plasma power modules. Its stated objective is to help wafer fabs obtain more performance from existing systems so customers can concentrate on process innovation and yield improvement.
Exhibits
WPIC's semiconductor plasma power system supplies stable and efficient electrical energy to plasma processes and is intended to support process reliability and consistency. The system precisely controls plasma parameters to support process stability and product yield in semiconductor manufacturing. WPIC specialists can adjust plasma characteristics using not only power but also voltage, current and frequency to meet complex advanced-process requirements. The power system is described as having high stability and precise output control for accurate, highly repeatable performance that reduces process variation and improves product consistency. Advanced digital control, Pulse control and Arcing detection are used to respond rapidly to the complex requirements of advanced processes. The system also provides multiple output modes and parameter settings to accommodate different process requirements. Its energy-efficiency design uses current power-electronics component technology together with high-frequency switching technology to improve system efficiency and reduce energy use and emissions. Beyond the plasma power system itself, WPIC's service portfolio includes semiconductor RF plasma-power monitoring and semiconductor plasma-chamber monitoring. Remote-plasma application for PECVD chamber cleaning and PVD-process Arc monitoring are also part of the listed semiconductor process-improvement capabilities. For RF delivery, the company lists semiconductor RF matcher optimization and fault detection as a service capability. For optical endpoint systems, WPIC lists refurbishment and maintenance for Optical endpoint detector components including Monochromator, H.O.T Pack and Endpoint PC. The complete offering therefore combines plasma-power supply and upgrade, power and chamber monitoring, chamber cleaning, Arc control, RF matching optimization, endpoint-detector maintenance and engineering support for semiconductor process stability and yield.
Capabilities and products
- sales and service of semiconductor plasma generation equipment
- technical support for semiconductor plasma systems
- 8/12-inch Etching, CVD and PVD Arcing detection and control
- semiconductor RF plasma-power monitoring
- semiconductor plasma-chamber monitoring
- remote-plasma PECVD chamber cleaning
- PVD-process Arc monitoring
- semiconductor RF matcher optimization and fault detection
- localization and improvement of key semiconductor components
- Optical endpoint detector refurbishment and maintenance
- semiconductor plasma-power maintenance and performance upgrades
- plasma control by power, voltage, current and frequency