At a glance
| Booth | N0282 |
| Website | www.new-cosmos.co.jp/industrial/semiconductor |
Company profile
TAIWAN NEW COSMOS ELECTRIC CO., LTD is the Taiwan operation connected with New Cosmos Electric’s gas-sensing and gas-alarm business and states that it will sell gas detection and alarm equipment in Taiwan while strengthening its sales structure as the semiconductor market expands. New Cosmos describes its broader product field as the development, manufacture and sale of gas sensors, gas alarms, gas detectors, fire alarms, odor sensors and air-quality monitoring equipment. Its Taiwan-facing product scope includes portable gas detectors and fixed industrial gas-detection and alarm systems, supporting industrial gas safety and monitoring in semiconductor fabs and related facilities. For hydrogen applications, New Cosmos has researched and developed gas sensors that selectively detect hydrogen with high sensitivity for about 40 years, and its gas detection alarms are installed at about 80% of the hydrogen stations currently installed nationwide. Its hydrogen-selective hot-wire semiconductor sensor can selectively detect hydrogen at 1000ppm (0.1%) or below even where other gases are present, and the sensor is used in gas alarms installed at hydrogen-station dispenser sections.
Exhibits
In semiconductor manufacturing, the company identifies gas-leak, poisoning and oxygen-deficiency risks because many processes use gases with toxic or combustible characteristics, and it positions gas detection and alarm equipment as part of fab gas-safety management. Its COSMOS method uses replaceable sensor units and is described as avoiding the need for gas-applied calibration at each site, which is intended to reduce contamination concerns in semiconductor factories where even small impurities can have major effects. For silicon-wafer manufacturing, where example gases include SiHCL3, H2, HCL and Ar, the listed products include the PS-8 series gas-detection section, the CLC-870 chemiluminescence arsine gas detector capable of detecting arsine from 1ppb, the KD-12II and PD-12II series with concentration display, and the XPS-7II semiconductor-material gas detector. For thin-film formation, with example gases SiH4, NH3, SiH2Cl2, H2 and O2, the same PS-8, CLC-870, KD-12II or PD-12II and XPS-7II product families are listed for poisoning prevention and on-site concentration checking. For etching, where example gases include HF, SiF4, C4F6, SF6, HCL, HBr, NF3, Cl2 and BCl3, the company again lists PS-8, CLC-870, KD-12II or PD-12II and XPS-7II equipment for toxic-gas monitoring. For ion implantation, where BF3, AsH3 and PH3 are given as example semiconductor-material gases, the same detector families are presented for gas-leak and poisoning risk management. For cleaning processes, where example gases include IPA, HF, O3, NH3 and NF3, the lineup adds the XP-3320II-V chemical-substance real-time monitor for chemical risk assessment alongside PS-8, CLC-870, KD-12II or PD-12II and XPS-7II. In cleanrooms, where leaks from gases used by semiconductor manufacturing equipment can create poisoning and oxygen-deficiency risks, the lineup includes PS-8, the KS-7O compact integrated oxygen detection alarm, CLC-870, KD-12II or PD-12II, XPS-7II, the XP-3368II-W combined gas detector for combustible gas and oxygen, and the wearable compact XO-2200 oxygen meter. The XPS-7II is identified as a semiconductor-material gas detector and a compact portable detector compatible with NF3, while the XP-3320II-V provides real-time chemical monitoring for environmental management and chemical-risk assessment.
Capabilities and products
- selective hydrogen sensor for concentrations below 1000ppm
- hydrogen gas detection alarm
- portable NF3 semiconductor-material gas detector
- 1ppb chemiluminescent arsine gas detection alarm
- multi-gas detector with replaceable sensor units
- real-time chemical substance monitor
- integrated oxygen detection alarm