At a glance
| Booth | M0634, R7124 |
| Country | JP |
| Website | shi-ms.com/en/products |
Company profile
Sumitomo Heavy Industries Material Solutions Co., Ltd. (SMS) develops, manufactures, sells and services ion implanters and laser systems for semiconductor manufacturing applications. SMS describes itself as Japan's only ion implantation system manufacturer to have developed four models of semiconductor device manufacturing systems. Its ion implanters have a delivery record covering all semiconductor device manufacturers in Japan, reflecting the company's domestic production and technology base. The company also focuses on exports to semiconductor device manufacturers in Asian countries including Taiwan. In a business where semiconductor processes change rapidly, SMS emphasizes fast technology development together with quality and customer support as part of its semiconductor device manufacturing system operations. SMS states that its ion implanters are developed and manufactured by taking advantage of technological capabilities available through its Japan operation, connecting that technology base with its domestic delivery record.
Exhibits
The laser-system offering includes the SWA20/22US（H） solid-state UV laser annealing system. The ion-implanter portfolio is organized into high-current, medium-current, high-energy and all-in-one systems, providing four equipment categories for different implantation requirements in semiconductor device manufacturing. High-current products include SHX-Ⅲ(HC) and NV-GSDⅢ-180, and high-current products also include SHX-Ⅲ/S; NV-GSDⅢ-180 is a batch-type high-current ion implanter. Within the high-current category, SMS provides both a batch-type system built around a high-reliability implantation system and a single-wafer system using proprietary beam-control technology to control implantation damage and implantation distribution. These high-current systems are positioned to deliver high-accuracy, high-quality and high-productivity ion implantation for semiconductor processing. The medium-current category includes MC3-Ⅱ(MC) and MC3-Ⅱ/GP medium-current ion implanters. SMS's medium-current implanters are designed for accurate control across a wide range of parameters and use a bilaterally symmetrical parallel optical system to achieve beam homogeneity in the horizontal scanning direction and high-precision beam parallelism. The high-energy category includes S-UHE(HE), SS-UHE Ⅱ and HE3, using a multi-stage RF linear accelerator system for high-energy ion implantation. SMS also provides a single-wafer ultra-high-energy implanter that extends implantation beyond the range covered by conventional high-energy equipment and is described as achieving ion implantation with unprecedented accuracy. SAion is the all-in-one ion implanter and provides a wide energy and dose range that covers the combined ranges of conventional medium-current and high-current implanters. Because SAion spans those ranges, it can process many implantation steps used in semiconductor device manufacturing on one implanter rather than relying only on separate conventional current classes. SAion delivers more than double the beam current in almost all operating ranges when compared with a medium-current ion implanter, which the company states results in a significant productivity improvement. Across the lineup, the product categories combine batch and single-wafer approaches, beam-control technology, precision optical design, RF acceleration and broad energy-dose coverage to address different semiconductor implantation conditions.
Capabilities and products
- development, manufacturing, sales and service of ion implanters
- solid-state UV laser annealing system
- high-current ion implanter
- medium-current ion implanter
- high-energy ion implanter
- all-in-one ion implanter
- single-wafer ultra-high-energy ion implanter