At a glance
| Booth | T9056 |
| Country | CN |
| Website | www.pullnerfilter.com/product/microelectronics-semiconductor-filter-cartridge |
Company profile
Shanghai Pullner Filtration Technology Co.,Ltd is located in Songjiang District, Shanghai and develops filtration process technology while providing technology consulting and services and conducting R&D, production, and sales of filtration equipment and filters. The company operates a 100,000-level clean production workshop with modern physics and chemistry laboratories and a sterile laboratory, more than 30 sets of production and welding equipment, more than 10 sets of advanced testing equipment, and a technical development and verification team. It states that it has 20+ years of industrial filter-cartridge experience, is ISO 9001 certified, provides certified filtration solutions with full-process traceability for semiconductor, chemical, and petrochemical industries, and serves clients in over 50 countries, including the UAE, Malaysia, and Turkey. Its high-purity filtration systems address ultra-pure water, chemicals, and process gases used in semiconductor fabrication, TFT-LCD, LED, display, electronics, and data-storage manufacturing, while other served industries include food and beverage, oil and gas, pharmaceutical, laboratory, desalination, automotive manufacturing, petrochemical, and power-plant filtration. The company also provides in-house material and quality-assurance testing with particle-counting analysis, pressure-drop testing, and material-compatibility testing, design and R&D services including custom filter design and system optimization, free filtration-system testing and custom filtration design with up to 2 free samples, and worldwide delivery with a global logistics network and local technical support.
Exhibits
The Microelectronics Semiconductor Filter Cartridge is listed for ultrapure-water and wet-etch applications, and the broader product range includes high-flow, pleated, string-wound, membrane, melt-blown, and stainless-steel filter cartridges, stainless-steel filter housings, FRP membrane housings, and high-temperature water filter elements. For semiconductor fabs with 300mm and 200mm wafer lines, Pullner lists cartridge applications in ultra-pure-water loops, CMP slurry filtration, photoresist dispense lines, and wet-process chemistry stations, including 0.05 to 0.2 µm absolute-rated PES and PTFE membranes for UPW polishing, 0.45 µm elements for CMP slurry, and sub-3nm pore-size verification using an on-site PMI analyzer and SEM imaging for photoresist applications. It states that every microelectronics cartridge is built in Class 100, Class 1000, or Class 10000 cleanroom facilities and presents its cleanroom-assembled cartridges as drop-in alternatives to Pall, Entegris, and 3M Cuno fab consumables. Cartridge families highlighted for fab use include electronic process-water filter cartridges for UPW polishing loops, photoresist filter elements for lithography dispense, and electronic slurry filter cartridges for CMP modules. The microelectronics filtration systems cover semiconductor fabrication, LCD, TFT, OLED display manufacturing, LED production, and data-storage manufacturing; processes include UPW, chemical, CMP slurry, wet etch and clean, and process-gas filtration using depth or surface filtration with PP, pleated PP, glass fiber, melt-blown PP, PES, PTFE, PVDF, and Nylon media. Available ratings span 0.02 µm to 200 µm depending on the application; high-flow designs use 152 mm or 160 mm diameters; standard lengths are 10, 20, 30, 40, and 60 inches with custom lengths available; operating fluids include ultra-pure water, process water, chemicals, CMP slurry, electroplating solutions, and cleaning and rinsing fluids; and gas filtration covers process gases used in lithography, etching, deposition, and cleanroom environments. The company states that its microelectronics filtration can improve equipment operating efficiency, extend equipment life, control particles and contaminants in data-storage electroplating and wet etch and clean processes, reduce display-process impurities, minimize downtime, and support higher yield, lower operating cost, stable process conditions, and consistent product quality. Filter selection is based on fluid or gas type, required micron rating, chemical compatibility, flow rate, operating pressure, cleanliness, and purity standards, while electronics-grade materials include polypropylene, PES, PTFE, PVDF, Nylon, glass fiber, and stainless steel 304/316L selected for their process and chemical requirements. Semiconductor chemical-filter options include PES membrane cartridges for general chemicals, PTFE membranes for aggressive acids and solvents, PVDF membranes for high-purity chemical delivery, and pleated PP cartridges for bulk-chemical prefiltration, with use in wet etch and clean, photoresist filtration, electroplating, and CMP slurry processing; these filters are 100% integrity tested and offered in standard and custom configurations. The electronic-grade precision filter element is a membrane cartridge offered in PTFE, Polyarylsulfone, nylon, PVDF, polyethylene, and polysulfone constructions, with PP, PTFE, and PES filter-material options, PP end caps, core, and cage, maximum operating temperature of 80°C, maximum differential pressure of 0.4 MPa at 21°C, and 0.6 to 0.7 m² filter area per 10 inches for 0.1 to 100µm pore ratings. This electronic-grade element is designed to limit iron extraction and is used for integrated circuits, data storage, flat-panel displays, and photovoltaics to filter chemicals, gases, ultra-pure water, CMP slurries, and photoresist; Pullner states that the controlled-environment filters have very low extractables and metal-ion content, each filter is independently integrity tested, particle retention reaches 99.99%, pore sizes from 0.02µm to 10µm are available, and hydrophilic PTFE versions do not require pre-wetting. High-flow filter elements receive 100% inspection before leaving the factory, and the company offers customized filtration systems for critical microelectronics process points together with high-flow cartridges for UPW, pleated cartridges for process water and chemicals, membrane cartridges for gas and liquid filtration, and stainless-steel housings for high-purity and corrosive environments. Microelectronics filtration systems are described as removing particles, contaminants, and chemical impurities from water, chemicals, and process gases, supporting ultra-pure water, chemical stability, and contamination control in semiconductor, display, and advanced-electronics manufacturing, where filter-element performance can affect end-product quality and economic results. Electronics-industry water filtration is described as multi-stage filtration using high-flow, pleated, and membrane filters for washing, rinsing, cooling, and chemical dilution, while gas filtration removes particles, moisture, and contaminants from lithography, etching, and deposition gases using high-efficiency membrane filters and stainless-steel housings to maintain gas purity and protect equipment. Electronics-grade filters are described as using higher cleanliness standards, tighter micron control, and high-purity-compatible materials to minimize extractables, withstand aggressive chemicals, and maintain consistent performance, while ultra-pure semiconductor chemicals including acids, bases, alcohols, solvents, and ketones require broad chemical compatibility.
Capabilities and products
- semiconductor ultrapure-water filter cartridges
- 0.45 μm filter elements for CMP slurry
- sub-3nm pore-size verification for photoresist filtration
- PES/PTFE/PVDF semiconductor chemical filter cartridges
- custom microelectronics filtration systems