At a glance
| Booth | H0009 |
| Country | JP |
| Website | www.nanosystem-solutions.com |
Company profile
NanoSystem Solutions, Inc. has developed and manufactured various inspection and measurement systems for semiconductor manufacturing processes and has built its technical capabilities by responding to advanced customer requirements in those fields. Separately from its inspection and measurement equipment, the company developed the maskless exposure system DL-1000, a lithography-related system that reflects know-how from a Digital Micromirror Device (DMD) and NanoSystem Solutions, Inc.'s proprietary optical technology. The company positions the DL-1000 as a system with potential to accelerate technology development in semiconductor, liquid-crystal, biotechnology, and other fields where lithography is central to microfabrication. NanoSystem Solutions, Inc. also develops and commercializes special lasers and is advancing laser processing equipment that can process materials directly. Its continuing optical-technology focus includes development of new light sources and development and provision of special optical products that are incorporated into precision instruments used in a variety of fields. Over many years, NanoSystem Solutions, Inc. has brought various inspection systems for Si wafers to market, building a semiconductor inspection history around silicon-wafer measurement and inspection. Among those capabilities, the company highlights Si-wafer flatness measurement and inspection technology created by combining advanced optical technology with image-processing technology. The company maintains a lineup of distinctive inspection systems based on these core technologies and states that it possesses optical and image-processing know-how for various specialized measurement and inspection applications. NanoSystem Solutions, Inc. is also developing a foundry business that uses its original maskless exposure and laser processing equipment, extending its technology from equipment development into processing services. At its own factory, the company undertakes contract processing of precision molds and special glass including sapphire, adding contract manufacturing work to its optical, lithography, laser, measurement, and inspection capabilities. By making full use of its optical and image-processing know-how, NanoSystem Solutions, Inc. states that it aims to become a leading company in Si-wafer measurement and inspection equipment.
Exhibits
NanoSystem Solutions, Inc. offers semiconductor-process inspection and measurement equipment, including inspection tools that detect defects on the outside or inside of Si wafers or glass substrates using the company's optical and image-processing technology. The company's maskless exposure offering is a separate microfabrication category: the DL-1000 combines a Digital Micromirror Device (DMD) with proprietary optical-technology know-how and is intended to support technology development in semiconductor, liquid-crystal, biotechnology, and other fields. Its maskless lithography system is described as a sub-micron-resolution tool with extremely fast patterning speed and the ability to create 3D structures on photo-resist. For photomask production, the company's Mask Writer is suited to second-layer PSM photomask patterning in advanced technology nodes and Binary photomask patterning for mobile, Internet of Things (IoT), and automotive applications. The Mask Writer uses a consumable-free design that the company says can drastically reduce production cost, and its performance is described as proven in advanced semiconductor fabs with high reliability. The inspection portfolio includes Visual Inspection Systems and Si-wafer inspection technologies that combine advanced optics and image processing, including measurement and inspection related to Si-wafer flatness. NanoSystem Solutions, Inc. also offers an Intelligent Edge Polishing system for efficiently polishing the edge of difficult-to-cut compound semiconductors, with the stated aim of contributing to improved customer yield. The company's microfabrication activities include development and commercialization of special lasers and work on laser processing equipment capable of direct material processing. Its optical-development scope includes new light sources and special optical products incorporated into precision equipment used across different fields, extending the offering beyond lithography and inspection alone. In inspection and metrology, NanoSystem Solutions, Inc. states that it has long supplied Si-wafer inspection systems and possesses optical and image-processing know-how for specialized measurement and inspection applications. The company is pursuing a foundry business that uses its own maskless exposure and laser processing equipment, providing a path from equipment technologies to contracted processing work. That foundry activity includes contract processing at the company's own factory for precision molds and special glass including sapphire. A high-definition processing laser development project is also listed among the company's new-business initiatives and is described as research and development supported by a fiscal-year 2014 Okinawa Prefecture new-industry R&D support project.
Capabilities and products
- semiconductor photomask writers
- second-layer PSM photomask patterning
- sub-micron maskless lithography
- compound-semiconductor wafer edge polishing
- Si wafer flatness measurement and inspection
- special-laser development and commercialization
- visual inspection systems