At a glance
| Booth | L0900 |
| Country | TW |
| Website | www.twm-chemical.com.tw/aboutus.htm |
Company profile
MITSUBISHI CHEMICAL TAIWAN CO., LTD. was established in 1996 and is operated as an affiliated company 100% owned by Mitsubishi Chemical Group. The company states that it seeks to satisfy customers while pursuing sustainable development of society and the planet and addressing environmental and social issues under its KAITEKI COMPANY concept. Its stated operating aims include providing high-qualified products and services, reducing waste and saving energy, prioritizing safety and stable manufacturing, applying conduct codes and commercial ethics, and developing a sustainable and creative company while improving its workforce. The Electronic Chemical Business Unit supplies high-purified electronic chemicals for semiconductor manufacturers in response to semiconductor-process quality requirements. The Precision Cleaning Business Unit applies precision-cleaning technology to machines and equipment with the stated purposes of improving yields and lowering costs. Other business units include Display Materials, which manages sales of color and black photoresist for the flat-panel monitor industry, and Engineering Plastics, which provides high-performance plastic solutions. The company also states that its Innovation and Research Office conducts investigations for advanced devices at a new laboratory in Taiyuan Science Park. Its company overview lists semiconductor high-purity chemical manufacturing and sales, precision cleaning of semiconductor-manufacturing equipment parts, flat-panel manufacturing chemicals, display materials, ion-exchange resin and functional engineering plastics among its business activities. Quality and environmental, health and safety certifications listed by the company include ISO9001, ISO14001 and ISO45001, while its policy page also displays ISO 14064. Company milestones include establishment of EL chemical and precision-cleaning business units in 1996, plant launches in 1997, precision-cleaning expansions in 2000, 2009 and 2017, and production-line expansions for water, ammonia water and sulfuric acid in 2013 and 2015. Later milestones include establishment of the display business in 2011, the name change to 台灣三菱化學股份有限公司 in 2020, group-company mergers and a KTF business unit in 2021, an ion-exchange resin business unit in 2022, and an engineering-plastics business unit in 2023.
Exhibits
For silicon-wafer cleaning, the company's high-purity electronic process chemicals are designed for increasingly fine semiconductor line widths and are described as having metal-impurity levels below 10 ppt. Its electronic-industry high-purity chemical range includes sulfuric acid, hydrogen peroxide, ammonia water and hydrochloric acid, while listed EL products include EL hydrochloric acid, EL nitric acid and EL ammonia water. The wafer-cleaning functions identified for these chemicals are particle removal, organic-residue removal and metal removal, supported by advanced analysis and quality-management technologies. The EL chemical business lists 30 years of manufacturing and sales experience, continued quality improvement through business with major semiconductor manufacturers, supply of higher-purity products as line widths become finer, and a complete quality-management system. AM1 is a high-function cleaning agent in the EL chemical family that combines high particle-removal and metal-removal performance and can be used as a high-performance RCA alternative for batch or single-wafer cleaning. AM1 is also described as enabling the particle-removal and metal-impurity-removal steps of batch RCA cleaning to be performed together, simplifying the cleaning process, while single-wafer use can reach a highly clean surface in a short time and metal-gate use can help prevent tungsten and silicon corrosion. MC1 is another high-function electronic-industry cleaning agent and RCA alternative that removes particles and metals, reduces the number of RCA cleaning steps, lowers metal contamination and helps prevent cross-contamination. For Cu/Low-K CMP post-cleaning, Mitsubishi Chemical Group offers acidic and alkaline Cu CMP post-cleaning agents intended to remove organic residue and particles from copper wiring and Low-k films without corroding or damaging the substrate. The listed CMP post-cleaning characteristics include high particle-removal performance, reduced damage to Low-K, effective organic-residue removal, improved Low-K surface wettability and reduced galvanic corrosion of Cu wiring. The Si Etch series is a silicon-wafer etchant for spin-etch equipment used to remove the processed damaged layer from wafer backsides, with applications including flat, mirror and rough surface treatment in wet-etch and single-wafer wet-processing equipment. Listed Si Etch products include Si Etch E at 25 μm/min, Si Etch F at 20 μm/min and Si Etch J at 8 μm/min for mirror treatment, MH-3 at 10 μm/min for mirror finishing, and Si EtchC at 3 μm/min plus Si EtchD at 2 μm/min for roughening treatment. The semiconductor supply scope also includes manufacturing and sales of high-purity chemicals for semiconductor production and precision cleaning of semiconductor-manufacturing equipment parts. The company separately identifies electronic-industry high-purity process chemicals as a core product category within this semiconductor-focused chemical and cleaning offering.
Capabilities and products
- high-purity semiconductor process chemicals
- RCA-alternative wafer cleaning agents
- Cu/Low-K CMP post-cleaning agents
- silicon-wafer backside etchants
- precision cleaning of semiconductor equipment parts
- color and black photoresist materials
- high-performance engineering plastics