KoMiCo Technology

Exhibitor at SEMICON Taiwan 2026 · Booth K2188

Booth K2188Country TW6 product topics
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BoothK2188
CountryTW
Websitewww.komico.com/eng
Exhibitor profile

Company profile

KoMiCo Technology originated from MiCo through the separation of precision-cleaning and special-coating activities for devices and tools used in semiconductor manufacturing. MiCo and KoMiCo Technology have developed precision cleaning and refurbishment technologies for functional consumable parts used in semiconductor and LCD manufacturing. Research and development since April 1998 expanded cleaning processes from Etch to semiconductor processes including CVD and Sputter and into display applications including LCD, PDP, and OLED. KoMiCo Technology continuously improves its working environment, service quality, and delivery time, while its precision-cleaning and special-coating technologies contribute to raw-cost reduction and yield improvement for customers. The company has expanded its business through carbon composite materials used in solar-energy and high-temperature-process industries. Its cleaning and coating technologies serve semiconductors, displays, and solar-photovoltaic industries, with a focus on maintaining process conditions and controlling micro-contamination.

Exhibitor profile

Exhibits

KoMiCo Technology's main business areas are precision cleaning, special coating, and professional analysis. Its precision cleaning and special coatings remove contaminants and particles from semiconductor equipment parts and restore surface conditions to extend equipment life, reduce consumable-part use, maintain process yield, and improve cost competitiveness. Micro-contamination control is used to keep equipment and components in optimum process condition, supporting process yield and productivity while reducing production costs, increasing equipment life, and improving the PM cycle. Since 2001, KoMiCo Technology has developed and operated its own MES to control and verify technology, production, quality, and logistics in real time and to support data accumulation and analysis for precision cleaning and coating. The company provides advanced cleaning and coating technology and quality-assurance services to minimize damage to high-function equipment components during contaminant removal and increase equipment efficiency. Its precision-cleaning process removes particles and ionic impurities while minimizing base-material damage, controlling damaged surfaces, extending product life, improving uniformity, and controlling micro-contamination for process requirements. Its cleaning-development stages include 0.3 ㎛ particle control with CO2 Cleaning, Bead, and Arc Coating, 0.1μm particle control with optimized physical cleaning and surface treatment, 0.04㎛ particle control with nano-cleaning and quality-management improvements, and 0.01um particle control with SMART Factory automation, flexible recipes, micro-process control, eco-friendly cleaning technology, longer product life, and shorter delivery time. CuStrip™, CleanPeel™, SurFinish™, and SurfRestore™ are major cleaning technologies for minimizing base-material damage, extending parts life, reducing particle sources, maintaining gas-flow uniformity, improving particles, and restoring process-damaged surfaces. CuStrip™ is used for contaminant removal in Cu processes with reduced base-material etch rate and longer parts life for products such as Al Collimator and AlCoverRing, while CleanPeel™ is used to reduce parts damage and extend the life of products such as PVD Process Shield. SurFinish™ addresses Al CVD Showerhead base-material and hole damage with particle-source reduction for CVD Process Showerhead, while SurfRestore™ restores plasma-etching surface damage on quartz products and supports gas-flow uniformity, particle improvement, and longer life for Quartz Window and Quartz pedestal products.

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