At a glance
| Booth | L0407 |
| Country | TW |
| Website | www.kanaue.com |
Company profile
KANAUE APPLIED MATERIAL CORP. was established in April 2007 by a team with creativity, technical capability, and deep industry experience. Its early work centered on fabricating clamps and fixtures for production equipment, and projects that improved customers’ machinery also built a strong foundation in workpiece engineering. After identifying market demand for surface-inspection equipment, the company invested substantial people, capital, and time to develop a series of benchtop, upright, and handheld surface-inspection systems. KANAUE APPLIED MATERIAL CORP. designs, manufactures, sells, and services equipment, tooling and spare parts, substitute materials, and cleanroom consumables for semiconductor, TFT-LCD, LED, and optoelectronics manufacturers. Its professional team brings extensive high-tech-industry experience and has led substitute-material and equipment-development projects for local and overseas customers. Two subsidiaries in Taiwan, in Hsinchu and Tainan, are positioned to provide prompt support to customers in the semiconductor, TFT-LCD, LED, and optoelectronic industries. The company states Integrity, Conscientiousness, Unity, and Sharing as its core values and also emphasizes employee value and social responsibilities. Its stated long-term customer benefits include increased yield, enhanced productivity, improved quality, and reduced cost of ownership through differentiated systems, products, and services. The company also reports environmental initiatives that include energy conservation and carbon reduction and the introduction of high-efficiency, low-pollution LND and LED lighting, while using lighting products to pursue a broader consumer market.
Exhibits
The optical-inspection portfolio spans AOI optical inspection, cameras, lenses, light sources, image-processing software, related components, optical fiber, visual optical inspection, and optical measuring instruments. The lighting and optical-source range includes halogen heating tubes and bulbs, RTP and EPI lamps, xenon and mercury lamps, short- and long-arc mercury lamps, deuterium lamps, low- and high-pressure sodium lamps, metal-halide lamps, strobe xenon lamps, electrodeless lamps, calibration standard lamps, solar-simulation lamps, optical reflectors and filters, 172 nm excimer lamps, laser tubes, yellow-process LED tubes, 254 nm germicidal lamps, and infrared heating tubes. For brittle materials and precision processing, the listed range includes grinding wheels, glass-cutting wheels, double-sided grinding cast-iron plates and carrier gears, vacuum ceramic chucks, precision ceramics, sapphire and aluminum-nitride substrates, quartz materials, diamond metal- and resin-bond series, precision cutting blades, sharpening stones, special coaxial cables and wire harnesses, and wafer backside protection films. Chemical, electrostatic, and dust-control offerings include specialty gases, chemical filters, chemical-liquid and chemical-gas leak detection, customized chemical materials, polishing slurry, electrostatic visualization, dust visualization, particle counters, electrostatic precipitators, needle-discharge and X-Ray ionizers, electrostatic meters, and air haze-removal equipment. The semiconductor and facility range also lists reclaimed silicon wafers, quartz plates, crucibles, rings and customized quartz products, quartz-transmittance inspection, smart screws, ESG energy-saving pumps, VSP voltage-drop protection devices, ESG power-saving current gainers, AOI flash power controllers, white-light confocal wafer-inspection equipment, Thermal Air Wafer ID Readers, and semiconductor heating jackets. The SES-PEGASUS Lamp is a Taiwan-made high-power halogen heater for semiconductor and industrial heating equipment, offered at 208V with 1500W and 2000W power options for vacuum chambers and precision processes. Its reinforced quartz tube and optimized filament are specified for a uniform infrared heat field and high infrared-conversion efficiency, with a stated service life of more than 2000 hours and cleaning of the quartz tube every 500 hours to maintain efficiency. The 1500W version is intended for smaller chambers or lower-temperature processes, while the 2000W version is used for higher-temperature EPI and CVD processes; heat-field uniformity is stated as ±1°C. For replacement applications, the lamp is described as matching the dimensions and interfaces of the AMAT Centura series when the power socket and specifications are confirmed, and it is also presented as a replacement for AMAT or USHIO lamps. The recommended configuration checks 208V three-phase power and SCR temperature-control compatibility, while maintenance includes monitoring brightness decay, checking seals, and planning spare-parts inventory and preventive maintenance. The quartz base is precision-machined from high-purity quartz glass with SiO₂ purity of at least 99.99%, uses a long flat structure with fixing holes at both ends, and is designed to lock onto equipment frames or support structures. It is specified for long-term use at temperatures up to 1100°C, with very low thermal expansion, resistance to strong acids, strong alkalis, and corrosive process gases, and dimensional stability for sustained positioning accuracy. Applications include semiconductor-equipment fixing bases, optical-element support substrates, internal supports for high-temperature furnace tubes, wafer positioning and carrying structures, precision-instrument positioning bases, and CVD chamber supports. Dimensions can be customized to equipment needs, including length, width, thickness, and screw-hole position, diameter, and spacing based on equipment drawings. Quartz-base selection distinguishes high-temperature furnace conditions above 900°C, corrosive-gas or strong-acid environments, and general high-temperature support when selecting thickness and quartz grade. The perforated quartz plate uses high-purity quartz glass with SiO₂ purity of at least 99.99%, with a circular plate format that can be customized and a precisely drilled, evenly distributed hole array whose diameter and spacing can be tailored. It functions as a gas- or liquid-diffusion plate so flow passes uniformly through the hole pattern, supporting process uniformity in CVD gas distribution, wafer-cleaning chemical spraying, diffusion-furnace airflow control, ALD, and precision filtration. The plate is specified for long-term use up to 1100°C and for resistance to strong acids, strong alkalis, and corrosive gases, while its high cleanliness is intended to avoid metal-ion contamination of process gases and wafer surfaces. Custom processing can set hole diameter, hole spacing, hole count, plate dimensions, and even non-circular plate shapes according to process and chamber requirements. Selection is based on gas or liquid flow, plate size and shape, operating temperature, and the type of process gas or liquid, with high-purity synthetic quartz identified for corrosive gases or strong-acid service. The quartz crucible is a thick-walled cylindrical vessel made from high-purity quartz glass with SiO₂ purity of at least 99.99%, with an open top and uniformly ground inner and outer walls. Its temperature specification is up to 1200°C for long-term use and up to 1400°C for short-term use, with thermal-shock resistance for rapid heating and cooling cycles and resistance to corrosive chemical reagents. It is used for semiconductor silicon-wafer crystal-growth processes, high-temperature melting and purification, laboratory ignition analysis, precious-metal smelting and refining, high-purity material synthesis, and TGA sample containers. Multiple standard capacities are available, and diameter, height, and wall thickness can be customized to required volume, temperature, material-purity, and thermal-cycle conditions. High-purity synthetic quartz is selected for semiconductor or other high-purity-material processes, while frequent rapid thermal cycling requires attention to thermal-shock grade and wall thickness. The quartz bell jar is made from high-purity quartz glass with SiO₂ purity of at least 99.99%, uses a semicircular dome structure with a central top opening for piping or sensors, and has precisely ground inner and outer walls with a frosted finish. Its thick, uniform wall provides heat insulation and light scattering, and the part is specified for long-term use up to 1100°C with resistance to strong acids, strong alkalis, and corrosive process gases. Applications include protection covers for semiconductor epitaxial-growth equipment, CVD process heat shields, high-temperature lamp protection chambers, wafer-heating uniformity covers, high-temperature process isolation, and diffusion-furnace insulation. The bell-jar diameter, height, wall thickness, surface treatment, and top-opening diameter and position can be customized to the equipment chamber, piping, or sensor requirements. For temperature-uniformity use, the frosted ground surface is described as scattering radiant heat from heating lamps more evenly through the chamber, while transparent polishing can be selected when optical viewing is required. Quartz wafer boats are precision-machined from high-purity quartz glass with SiO₂ purity of at least 99.99%, using multi-layer comb-like slots at fixed intervals and support feet for stable placement in furnace tubes or equipment chambers. They are available for 4-inch, 6-inch, 8-inch, and 12-inch wafers and can carry 25 to 200 wafers depending on specification, with capacity and slot spacing customizable to batch and gas-flow requirements. The boats are specified for long-term use up to 1200°C in diffusion, oxidation, LPCVD, and annealing furnaces, where fixed wafer spacing supports uniform heat and gas exposure and process uniformity. The stated cleanliness level is semiconductor grade with zero particle contamination, and the material is described as releasing no metal ions that could affect wafer-process cleanliness or film quality. For long-term use, surface frosting can occur, so periodic acid cleaning or surface repolishing is recommended; cleaning and repair service for quartz boats is also offered. Quartz windows use high-purity fused silica, with circular and rectangular formats, optical-grade double-side polishing, high flatness, and high transmission from deep UV at 185 nm through the near-infrared range. They combine low birefringence, a high laser-damage threshold, and long-term thermal resistance up to 1100°C for laser transmission, spectroscopy, precision measurement, UV curing, and semiconductor-chamber optical windows. The window range is described for high-power lasers including UV excimer and Nd:YAG systems, polarization-sensitive optics, interferometric measurement, and precision optical-instrument lens substrates. Single-layer or multilayer anti-reflection coatings can be applied according to the operating wavelength to reduce surface reflection and improve system transmission. Standard circular and rectangular sizes are available, while diameter, side length, thickness, edge chamfer, optical-flatness, and surface-finish requirements can be customized for the optical system or chamber interface. Custom quartz components are offered in high-purity synthetic quartz glass or natural fused quartz, with SiO₂ purity of at least 99.99%, and cover irregular parts, flat plates, circular wafer carriers, and multi-piece assemblies. The components are specified for long-term use up to 1100°C and short-term use up to 1300°C, with resistance to acids, alkalis, and corrosive gases for semiconductor processes, optical systems, and high-temperature reactors. Optical transmission extends from UV to near-infrared, and surface finishing can reach optical-grade polishing for optical and precision-inspection applications. Custom machining includes irregular cutting, drilling, slotting, and polishing, with dimensions and hole patterns produced from customer drawings and 2D or 3D geometry. Material and finish selection can be matched to operating temperature, wavelength range, shape, dimensions, and surface precision, including synthetic quartz for higher purity or UV transmission and natural quartz for general high-temperature or visible-light use. Quartz wafer paddles are high-purity quartz carriers with SiO₂ purity of at least 99.99%, using a U-shaped fork structure and bottom screw holes for integration with robotic arms and automated equipment. They are customizable for 4-inch, 6-inch, 8-inch, and 12-inch wafers, are specified for long-term use up to 1100°C, and are intended for wafer transfer, CVD, diffusion furnaces, oxidation-furnace handling, and automated semiconductor lines. The high-purity quartz is described as avoiding metal-ion release and particle contamination under normal operating conditions after precision machining and cleaning, supporting wafer-process cleanliness and yield. Paddle dimensions and bottom mounting-hole locations, diameters, and spacing can be customized from equipment-interface drawings to dock with existing transfer systems. For high-temperature furnace service above 900°C, selection requires confirming quartz grade and wall-thickness design, while front-end semiconductor processes are directed to synthetic high-purity quartz. The infrared heating range covers wavelengths from 750 nm to 1 mm, including short-wave 0.75-1.4 μm, medium-wave 1.4-3 μm, and long-wave 3-1000 μm radiators in single-tube, twin-tube, 3D-profile, module, system, and ceramic-reflector configurations. Quartz twin-tube radiators are described as reaching peak output in about 3 seconds with 1-3 second heat-up and cool-down response, high power density of 50-200 W/cm², and approximately 50% energy savings because radiant heating does not require an intermediate heat-transfer medium. Wavelength can be matched to material absorption, with short-wave specified for glass and metal, medium-wave for plastics and wood, and long-wave for food and coatings; examples also identify 1.8 μm for plastics, 2.5 μm for inks, and 1.2 μm for glass. The ceramic-reflector option uses an Al2O3 substrate with stated reflectance above 98% from 0.8 to 5 μm and resistance to 1400°C without discoloration, supporting energy utilization above 90% and concentrated, uniform heating. Selection also considers tube lengths from 50 to 2000 mm, power density, reflector matching, ventilation that keeps ambient temperature below 50°C, and expected life of 3,000 to 10,000 hours depending on wavelength. Typical infrared applications include ink drying, UV-coating preheating, thermoforming and welding, film drying, and glass curing, with IR plus hot air recommended in printing and plastics when direct rapid heating and deeper penetration are both required. The ARTCAM-487UV is a high-sensitivity industrial ultraviolet camera using Sony Semiconductor Solutions’ IMX487 CMOS image sensor across the 200-400 nm UV range for low-noise, high-quality imaging where visible light is insufficient. The IMX487 is described with a 2.74 μm pixel size and the highest effective pixel count in its class for a 2/3-inch sensor format. Applications include semiconductor inspection, material sorting, micro-scratch and surface-irregularity detection, infrastructure inspection, and life-science research. The camera can integrate with existing machine-vision systems, imaging software, and production-line setups and can be paired with lenses, light sources, and filters as a complete UV optical-inspection configuration. Camera selection is based on the required wavelength within 200-400 nm, defect size and resolution, material and lighting behavior, working distance, field of view, installation space, and compatibility with the existing software or equipment environment.
Capabilities and products
- production-equipment jigs and fixtures fabrication
- benchtop, upright, and handheld surface-inspection equipment
- AOI automated optical inspection
- visual optical inspection
- optical measuring instruments
- image-processing software
- halogen heating lamps
- RTP lamps
- EPI lamps
- xenon lamps
- mercury lamps
- deuterium lamps
- calibration optical standard lamps
- solar simulator lamps
- 172nm excimer lamps
- 254nm sterilization lamps
- IR heating lamp tubes
- glass cutting wheels
- vacuum ceramic chucks
- sapphire substrates
- aluminum nitride substrates
- precision cutting blades
- chemical liquid leak detection
- chemical gas leak detection
- customized chemical materials
- grinding and polishing slurry
- dust particle counters
- electrostatic precipitators (EPF)
- static eliminators
- reclaimed silicon wafers
- quartz transmittance inspection
- white-light confocal wafer-inspection equipment
- Thermal Air Wafer ID Reader
- semiconductor heating jackets
- custom quartz base machining
- custom perforated quartz plate machining
- custom quartz crucible machining
- custom quartz bell-jar machining
- custom quartz wafer-boat machining
- quartz wafer-boat cleaning and repair
- custom quartz-window machining
- anti-reflection (AR) coating for quartz windows
- custom quartz cutting, drilling, slotting, and polishing
- custom quartz wafer-paddle machining
- 750nm–1mm infrared heating systems
- 200–400 nm industrial UV cameras