Hefei SHAREWIN Semiconductor Material Co., Ltd. / 合肥先微半导体材料有限公司

Exhibitor at SEMICON Taiwan 2026 · Booth T9039

Booth T9039Country CN9 product topics
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BoothT9039
CountryCN
Websitewww.swgases.com
Exhibitor profile

Company profile

Hefei SHAREWIN Semiconductor Material Co., Ltd. / 合肥先微半导体材料有限公司 develops, produces, stores, transports, and supplies gases for electronic and industrial applications. Its product structure includes electronic specialty gases, electronic mixed gases, excimer-laser gases, ultra-pure gases, and industrial gases used by semiconductor and other manufacturing sectors. The company lists its headquarters in Hefei Xinzhan Chemical Park and describes production operations in Feidong, Lu'an, and Wuhu. Production technologies include synthesis, adsorption, rectification or distillation, purification, and filling, supported by quality-control and transportation functions. Application markets named for the gas portfolio include integrated circuits, LCD, LED, optical fiber, solar energy, and automotive manufacturing. The company combines gas research and production with storage and transportation so high-purity and mixed-gas products can be supplied as part of an integrated gas operation.

Exhibitor profile

Exhibits

Boron trichloride, BCl3, is offered for semiconductor etching, ion implantation, display-panel etching, and boron doping of photovoltaic cells. High-purity electronic-grade dichlorosilane, DCS, is supplied as a raw material for semiconductor and photovoltaic manufacturing, including chemical vapor deposition and epitaxial growth on silicon wafers. Helium is used for precise temperature control in ion-implantation processes and as a carrier gas in chemical vapor deposition. F2/N2 mixtures are used for dry etching and process-chamber cleaning where the application calls for selective reaction and low contamination. The specialty-gas portfolio includes C2F6 at 5N purity in 47 L and 470 L packages, with CGA660 and DISS716 interface information listed. C4F8 is listed at 5N purity in a 47 L package, while DCS, SiH2Cl2, is listed at 4N purity in 40 L and 450 L packages. BCl3 is listed at 5N purity in 47 L and 470 L packages, and SiCl4 is supplied to customer specification in 38 L, 200 L, and 240 L package sizes. NF3 is listed at 5N purity with 40 L, 47 L, and 470 L cylinder options as well as bundle configurations. Mixed-gas products include PH3/H2, B2H6/H2, SiH4/N2, F2/N2, HCl/H2/Ne, and H6Si2/N2 formulations. Mixed-gas concentration, package form, and valve or interface configuration can be supplied according to customer requirements. The industrial-gas range includes liquid oxygen at 99.5 percent, nitrogen at 5N or 99.999 percent, argon at 5N, carbon dioxide at 2.5N or 4N, helium at 4N or 5N, and hydrogen at 4N or 5N. Other industrial gases named in the portfolio include acetylene, propane, methane, ammonia, and ethylene oxide. In semiconductor processing, the application portfolio includes hydrogen and oxygen reactions as well as silane, germane, and phosphine use in deposition of polysilicon, silicon dioxide, and silicon nitride. Display-panel uses include cleaning, etching, and deposition, while photovoltaic uses include wafer cleaning, etching, deposition, and related process-gas steps. The gas portfolio also extends beyond electronics to food applications using nitrogen and carbon dioxide, reflecting the same gas-production platform across multiple industries. Across the semiconductor-facing range, electronic specialty gases, high-purity industrial gases, and customer-formulated mixtures provide gases for etching, implantation, deposition, epitaxy, doping, chamber cleaning, and thermal-control processes.

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