At a glance
| Booth | P5720 |
| Country | US |
| Product categories | Process Monitoring systems · Data Collection; Building control systems · Process Controls · Production Control software · Test Programs · Yield Mgmt; Process Control Software · Statistical Analysis; Modeling; Cost of Ownership (CoO) Software · Failure Analysis and other Analytical Services · Measurement; Inspection Service · Manufacturing Process Support and Development · IT; Data Processing Services |
| Website | gausslabs.ai |
Company profile
Gauss Labs is an industrial AI startup founded in August 2020. We are machine learning experts with deep knowledge of the manufacturing domain. We provide an industrial AI solution called Panoptes, software-defined metrology solution. Our anchor product, Panoptes Virtual Metrology (VM), predicts the process outcomes using existing fab data and our state-of-the-art AI technology, which enables customers to manufacture their products better, less costly, more, and faster through numerous use cases.
Exhibits
Our AI-powered manufacturing data intelligence products transform the industry with analytics and insights from a vast amount of machine-generated data beyond human capability and comprehension. Our software trains and manages models automatically for you, eliminating the need for in-depth knowledge of machine learning algorithms. Our solutions easily scale to high-volume manufacturing and incorporates domain knowledge into models. Our solutions are deployed in your environment to satisfy security compliance and avoid IP issues. Our solutions are deployed in your environment to Panoptes Virtual Metrology (VM) predict process outcomes based on process state data and wafer state data. With minimal effort, Panoptes VM allows you to train and update models, operate models in fab scale, and to adopt domain knowledge. Panoptes VM sends all-wafer data to your systems to support various use cases, such as process control, equipment maintenance, and yield management. Panoptes Image Metrology (IM) is an end-to-end solution offering a flexible pipeline with customizable metrics. Powered by AI-driven algorithms, driven algorithms, Panoptes IM provides precise results with consistency and repeatability, requiring less training and repeated manual work. Panoptes IM allows you to measure process outcomes more efficiently and to unlock deeper insights beyond current understanding from metrology images.
Capabilities and products
- AI prediction of semiconductor process outcomes from fab data
- AI-driven image metrology algorithms
- Panoptes Image Metrology (IM)
- Panoptes Virtual Metrology (VM) for semiconductor fabs
- all-wafer data output for process control
- automatic model training and management for fab-scale metrology
- process-state and wafer-state virtual metrology modeling
- virtual metrology data support for equipment maintenance
- virtual metrology data support for yield management