At a glance
| Booth | P6212 |
| Country | KR |
| Website | frdbiz.com |
Company profile
FRD CO., Ltd. supplies specialty gas to semiconductor manufacturing and other industries while providing technical solutions to customers, and it describes promptness, trust, and problem-solving capability as requirements for operating in a changing industrial environment. The company states that its employees pursue innovation, customer satisfaction, and growth together with customers, and it frames its role as contributing to society while maintaining its own approach and staying close to customer needs. FRD CO., Ltd. calls its operating strength a 3-beat capability and states that it intends to remain at the customer's side without losing its originality, linking responsiveness and problem solving with a continuing customer relationship rather than presenting gas supply as a stand-alone transaction.
Exhibits
FRD CO., Ltd. describes itself as a specialized manufacturer of specialty gases for the semiconductor, solar, display, and LED industries and covers both production and sales of gases used in semiconductor and related materials industries, with technology development aligned to customer needs and a customer-focused approach. Hydrogen chloride is listed as HCl, also shown as HCL, at 5N purity for an etching process, with wafer-surface contaminant removal identified as its key use; this places the gas directly in wafer cleaning and etching-related semiconductor processing described by the product information. Chlorine, Cl₂, is listed at 5N purity for metal etching including Al and W, with strong etching capability identified as a feature, while fluorine, F₂, is listed at 5N for high-speed metal etching and is explicitly marked as highly toxic and explosive in the same product table. NF₃ is listed at 4N purity for the CVD chamber cleaning process, with generation of F after plasma dissociation given as its process-related feature, tying the gas offering to chamber-cleaning requirements in semiconductor process equipment. The product information further identifies Excimer Laser Mix and methane, CH₄, as specialty-gas product categories, while the surrounding product structure organizes common information by gas name, chemical formula, purity, key process, and features or remarks. Across these products, FRD CO., Ltd. states that it explores new markets and technologies and develops technology in line with customer requirements for specialty-gas applications in semiconductor, solar, display, LED, and materials-industry processes. The specialty-gas business also emphasizes product quality, proactive technology development, and exploration of markets and technologies that have not yet been established, with those activities framed around semiconductor and adjacent industrial customers rather than around a fixed list of existing gases alone.
Capabilities and products
- manufacturing of 5N HCl specialty gas for semiconductor etching
- manufacturing of 5N Cl₂ specialty gas for metal etching
- manufacturing of 5N F₂ specialty gas for high-speed metal etching
- manufacturing of 4N NF₃ specialty gas for CVD chamber cleaning
- manufacturing of Excimer Laser Mix specialty gas
- manufacturing of CH₄ specialty gas