At a glance
| Booth | R7312 |
| Country | KR |
| Website | www.cn-1.co.kr |
Company profile
Customers in the high-technology fields of semiconductor, display and nano technologies require continuing R&D of equipment and process technology. CN1 Co., Ltd has pursued technical development and innovation in ALD equipment and process technology in response to continuing R&D requirements from semiconductor, display and nano-technology fields. Since 2008, the company has developed its Atomic Layer Deposition business through aggressive investment in R&D. CN1 Co., Ltd identifies itself as a leading supplier of Atomic Layer Deposition (ALD) equipment. Its equipment designs and process technologies have been developed intensively for more than a decade and are described as thoroughly proven and perfected. The company's ALD systems serve high-technology organizations working in semiconductor and display industries. Bio-tech and advanced energy organizations are also included among the industries using CN1 Co., Ltd ALD systems for nanotechnology applications and production needs. In Korea, CN1 Co., Ltd ALD systems are widely used by hundreds of universities, National Institutes and enterprises. The company's ALD equipment is also in use at hundreds of leading universities, research institutes and companies across the countries identified in its global business footprint. That footprint includes the U.S.A., Japan, Singapore, Taiwan, Russia and China in addition to Korea. CN1 Co., Ltd states that its supplied ALD systems are recognized by renowned universities and companies. The name CN1 is derived from the phrase 'Can Be the Number One.' The company links its goal of becoming a globally reliable business to the innovativeness of its ALD technology and to continued growth as a global company.
Exhibits
CN1 Co., Ltd's ALD product range includes Atomic Premium, Atomic Classic, Atomic Mega and Atomic Deka. The range also lists Atomic Basic, Atomic Shell and Atomic Cluster, together with Coating Solution and other items. Atomic Premium supports Thermal & Plasma Enhanced ALD Process, covering both thermal and plasma-enhanced ALD process capability. For Atomic Premium, the standard substrate size is 4 ~ 12” for wafers. The system supports a Thermal ALD Process and makes a Plasma Process available as well. The gap between the showerhead and substrate is adjustable, providing a specified mechanical adjustment within the process module. Its gas delivery system supports Bubbler, LDS and related delivery configurations. The maximum listed temperature is 500 ℃ at the wafer. The standard precursor-canister configuration supports up to 4 sets. Pressure is automatically controlled by a throttle valve. The process gauge is a CDG Gauge with a listed range of 10 Torr. A Dry Pump is specified for the process pump, with a Rotary Pump available as an alternative. The pumping line includes a Hot Trap intended to reduce particles. The stated configuration therefore combines wafer handling from 4 ~ 12”, thermal and optional plasma ALD operation, adjustable showerhead-to-substrate spacing, configurable gas delivery and automatic pressure control in the Atomic Premium platform. Its listed operating specifications also combine a maximum temperature of 500 ℃ at the wafer, up to 4 precursor-canister sets, a 10 Torr CDG Gauge, dry-pump operation with a rotary-pump option, and a pumping-line Hot Trap for particle reduction.
Capabilities and products
- ALD equipment supply
- Thermal ALD process
- Plasma Enhanced ALD process
- 4~12-inch wafer ALD system
- ALD processing up to 500℃ at wafer