At a glance
| Booth | M1139 |
| Country | TW |
| Website | www.ci-semi.com |
Company profile
CI SEMI is a division of CI Systems Ltd that develops, manufactures and markets process monitoring and control systems for industrial process environments. Its process monitoring and control business addresses the semiconductor, solar PV, LED and FPD markets. CI SEMI has been active in the semiconductor process equipment market since 1992. The company supplies non-contact wafer temperature monitoring and wet-process concentration monitoring technologies as part of its process-control portfolio. These monitoring products are offered to both equipment OEMs and end users, giving CI SEMI a customer base that includes equipment makers as well as facilities that operate semiconductor and related production processes. Its technical approach covers both thermal measurement without wafer contact and analysis of wet-process chemistry, so the company addresses two different process variables through dedicated monitoring families. Within those fields, CI SEMI combines process monitoring with control-oriented measurement functions intended for use directly in semiconductor and related manufacturing environments.
Exhibits
CI SEMI provides in-line, real-time process monitoring tools for the semiconductor, PV and FPD industries. The NTM line is the company's family of noncontact temperature monitors for process monitoring applications. NTM monitors incorporate real-time, same-point emissivity measurement together with emissivity compensation. By measuring emissivity at the same point and compensating for it in real time, the NTM family is positioned for in situ process monitoring where the wafer temperature must be observed without contact. The NTM Delta is a high-accuracy, high-repeatability pyrometer in the NTM family. NTM Delta incorporates both real-time same-point emissivity measurement and real-time temperature measurement in the same pyrometer. CI SEMI describes NTM Delta as the only high-accuracy and repeatability pyrometer that combines those real-time same-point emissivity and temperature measurements. For wet processes, the WetSpec line is a family of analyzers intended for in-line wet chemistry monitoring. WetSpec covers concentration measurement in simple chemistries as well as analysis of more complex solutions, with the measurement method selected according to the chemistry. For simple chemistries, the WetSpec range includes conductivity-based solutions for concentration measurement. The same range also includes NDIR solutions for measuring concentration in simple chemistries. For complex solutions, WetSpec extends beyond single-concentration methods to spectroscopic systems. Those spectroscopic systems are used to measure multiple constituents in a complex solution rather than limiting the measurement to one simple chemistry. The spectroscopic WetSpec systems also measure residues in complex solutions, adding residue analysis to the same in-line wet-process monitoring range. Together, the NTM and WetSpec product families cover non-contact wafer temperature monitoring, real-time same-point emissivity measurement and compensation, in-line wet chemistry monitoring, conductivity and NDIR concentration measurement, and spectroscopic measurement of multiple constituents and residues.
Capabilities and products
- non-contact wafer temperature monitoring
- real-time same-point emissivity measurement and compensation
- in-line wet-process chemistry concentration monitoring
- conductivity/NDIR chemical concentration measurement
- spectroscopic measurement of multiple constituents and residues