At a glance
| Booth | Q5230 |
| Country | TW |
| Website | www.mesoscope.com.tw |
Company profile
TrInity Analysis Tech Co., Ltd. is a Taiwan-based company focused on semiconductor analysis and inspection, with activities spanning nanotechnology equipment and tools, test and failure-analysis systems, probing equipment, and measurement and inspection service. The company is located in Hsinchu, Taiwan, and was established in 2025. Its semiconductor-related scope combines nanotechnology tools, test and failure-analysis systems, probing equipment, and measurement and inspection service, linking physical probing with analytical and inspection-oriented work. Mesoscope Technology is identified as a director legal entity, and the company's positioning is connected with Mesoscope-related analysis technology and nano-probe or failure-analysis offerings for advanced semiconductor devices. Within that analysis focus, TrInity emphasizes low-damage nano-probe analysis for advanced semiconductor devices, connecting its technical route to the nano-probe and failure-analysis fields. The company is a newly established Taiwan semiconductor-analysis and inspection entity whose activities combine nanotechnology tools, probing equipment, test and failure-analysis systems, and measurement and inspection services. Equipment categories and measurement and inspection service are combined within one semiconductor-analysis context, bringing probing, failure analysis, nanotechnology tools, and inspection work into the same technical scope. By combining nanotechnology equipment with measurement and inspection service, TrInity covers both equipment-oriented and service-oriented parts of semiconductor analysis, while test and failure-analysis systems and probing equipment place physical probing within a broader analytical workflow for advanced devices.
Exhibits
The nano-probing capability uses an ultra-low-energy electron beam below 200 eV, a specified operating condition intended to reduce sample damage during nano probing. After 30 minutes of continuous electron-beam irradiation, the measurement-data deviation can still be controlled below 5%, providing a stability figure for prolonged exposure under this probing method. Together, the below-200 eV beam condition and the below-5% deviation after 30 minutes define the performance: nano probing is carried out at very low electron-beam energy to limit sample damage while maintaining controlled measurement variation during continuous irradiation. This nano-probing function aligns with the company's broader categories of probing equipment, nanotechnology equipment and tools, test and failure-analysis systems, and measurement and inspection service for advanced semiconductor-device analysis.
Capabilities and products
- nano probing with electron beams below 200 eV and ≤5% deviation after 30 minutes