At a glance
| Booth | L0216 |
| Country | TW |
| Website | www.pall.com |
Company profile
Pall Singapore Taiwan Branch Holding Co., Pte. Ltd.-HsinChu Office represents a business whose microelectronics activities provide filtration, separation and purification technologies for the microelectronics and photovoltaic industries and support semiconductor, data-storage, fibre-optic, advanced-display and materials markets. Its microelectronics contamination-control scope covers chemical, gas, water, chemical mechanical polishing (CMP) and photolithography processes, including technologies described for 7 nm processing and beyond. Pall traces its broader filtration, separation and purification work to 1946 and describes collaboration with customers on challenges involving protection of health and critical assets, improvement of quality and reduction of waste. Its High Flow Gas solution targets particulate removal from large-volume gas streams while reducing upfront CAPEX through smaller vessels and fewer elements, with the stated effects of reducing footprint and maintenance demands while protecting downstream equipment. The wider portfolio includes Membralox GP-IC ceramic-membrane systems for food and beverage processing, designed to reduce waste and downtime while supporting premium ingredients and alternative-protein production. Supralon replacement oil-filter elements are positioned to establish and maintain cleanliness levels that protect lubrication and hydraulic systems from component failure and unplanned downtime. For semiconductors, Pall offers purification and filtration technologies for cleaning methods and manufacturing processes, and states that manufacturers select its products for process-enabling features, quality, cost reduction and productivity improvement. Across other markets, Pall also describes beer-filtration expertise, aerospace solutions and work on redesigning critical processes for sustainability, illustrating a filtration and purification portfolio extending beyond semiconductor manufacturing.
Exhibits
For semiconductor manufacturing, Pall provides filtration and purification solutions from lithography and wet etch through dry etch, deposition, CMP, chemical delivery, process-gas filtration and purification, and ultrapure-water systems, supporting contamination control from process development to high-volume manufacturing. The targeted contaminants include particles, gels, agglomerates, metals and molecular contaminants, because even trace contamination can affect yield, create defects, reduce device performance and reliability, and increase downtime. The stated roles of filtration and purification include improving yield and reducing defects, protecting process chambers and equipment, maintaining consistent process chemistry, controlling particle-size distribution in process fluids, reducing excursions and unplanned maintenance, and enabling scaling to advanced nodes. Pall works with semiconductor manufacturers, OEMs and chemical suppliers on contamination challenges throughout fabrication and offers process-specific solutions for wet etch and clean, process-gas filtration, lithography, process-gas purification, CMP, electronic-grade chemicals and ultrapure water. For ultrapure water, the offering combines filtration, purification and ultrafiltration for wafer cleaning and rinsing, with the stated aims of consistent UPW quality, lower particle precursors and other trace contaminants, and consistent high-yield device performance. The semiconductor portfolio also addresses submicron particles, gels, metallic ions and molecular contaminants and extends to advanced packaging, where it is described as removing ultra-fine particles, supporting purity across chemicals, gases and UPW, and maintaining process consistency. For semiconductor chemicals, Pall supplies filtration, purification and separation for chemicals, gas, water, CMP slurries and photoresist, drawing on decades of experience in semiconductor and related industries and applying strict quality-control programs across a selection of filter materials. The chemical-filtration performance described includes sub-ppb total metal on extractables, low pressure drop and retention to 5 nm with PTFE, with applications including integrated circuits, data storage, flat-panel displays and photovoltaics. Filter construction materials named for this portfolio include PTFE, polyarylsulfone, nylon, PVDF, polyethylene and polysulfone, and a highly asymmetric polyarylsulfone membrane is described as improving filtration while lowering operating costs. Pall electronics-grade high-purity chemical filters are specified under stringent quality-control programs, and the portfolio is intended to improve critical chemical processes in semiconductor manufacturing. Chemical compatibility is treated as application-specific: users are directed to pretest under their own operating conditions and to check housing ratings, with PP Megaplast housing given as an example that has a water rating and is not recommended for chemicals. For CMP, Pall filters control slurry-particle size and concentration, including Large Particle Counts, to specified process parameters with the stated goals of defect reduction, yield improvement and process stability. Pall describes filter-retention and quality improvements as reducing Cost of Ownership, while its specialists optimise filtration schemes to increase filter throughput at slurry suppliers and device manufacturers, including point-of-use and slurry-distribution locations. The Pall Kleen-Change In-Line filter capsule is offered for point-of-use CMP and uses customisable media for critical planarisation processes. Profile Nano filters use fine meltblown fibres and graded filter zones, with each zone having its own specification to promote more consistent particle loading through the filter depth. CMP Starkleen Nano capsules carry the Profile Nano fibre and grading approach while adding size and fitting customisation, and are available in 4.5-inch, 8.5-inch and 13-inch lengths with flaretek and NPT fittings. Slurry filtration can be positioned in the recirculation or global loop, at point of use near the polish tool, or between a slurry supplier tote or drum and the day tank; Pall offers media and configurations for both bulk and POU applications, with benefits including process control, efficiency, longer filter life or slurry throughput, defect reduction and extended Slurry Delivery System PM intervals. For UHP process gases, Pall filters are designed to address outgassing and particle shedding; metal-fibre technology supports rapid gas displacement and molecular transparency during maintenance or system upsets. O-ringless Gaskleen IV and V PTFE membrane filters are intended to avoid o-ring deformation and filter bypass in critical ammonia (NH3) and ozone (O3) applications, with use in bulk-distribution and point-of-use systems and benefits including fewer gas-related defects and reduced outgassing and particle impurities. The aerospace range includes high-performance filters and complete filtration systems for customers worldwide, combining filtration, separation and purification with contamination and particulate control intended to protect critical operating systems, improve component reliability and support air and drinking-water purification. Aerospace applications include hydraulic, fuel, lubrication and air systems, with product categories covering commercial aircraft, military aircraft, helicopters, military vehicles, cabin-air filtration, sustainable aviation, engines and maintenance, repair and overhaul. Pall Aerospace dates its filtration and separation work to 1946 and states more than 70 years of expertise in integrated solutions for commercial and defence sectors worldwide. Its aerospace support organisation spans 30 countries and is backed by capabilities in fatigue testing, CFD and compliance. The aerospace business states that its products are trusted by OEMs and defence contractors worldwide, offers tailored filtration systems for specific mission profiles, and provides service and support across the aerospace lifecycle.
Capabilities and products
- semiconductor wet-etch and clean filtration
- semiconductor process-gas filtration
- lithography chemical filtration
- semiconductor process-gas purification
- CMP slurry filtration
- electronic-grade chemical filtration
- ultrapure water (UPW) filtration and purification
- high-performance aerospace filters
- high-performance high-flow gas filtration
- ceramic membrane filtration systems