At a glance
| Booth | T9404 |
| Country | US |
| Website | www.nabulitho.com |
Company profile
Nabu Optical Systems builds maskless direct-write lithography tools that take the photomask off the critical path. Our flagship system, the ANU-1, patterns wafers and substrates directly from a design file — no reticles, no mask shop lead times, no minimum order quantities. It's built for R&D all the way to low volume production, photonics and compound semiconductor lines, advanced packaging, and any team whose designs change faster than a mask set can be ordered. Spun out of photonics research at the University of Dayton, Nabu combines optical engineering, precision motion control, and a purpose-built exposure architecture in a compact platform sized for a standard cleanroom bay. The ANU-1 is designed to close the gap between benchtop prototyping and low-volume production, letting process engineers iterate in hours instead of weeks. Stop by to learn more about the ANU-1, discuss your patterning requirements, and ask about pilot programs and early access.
Exhibits
ANU-1 maskless direct-write lithography system, which patterns wafers and substrates directly from a design file for R&D through low-volume production.
Capabilities and products
- maskless direct-write lithography tools
- ANU-1 patterns wafers directly from a design file
- no reticles, no mask shop lead times, no minimum order quantities
- for photonics and compound semiconductor lines
- compact platform sized for a standard cleanroom bay
- letting process engineers iterate in hours instead of weeks
- spun out of photonics research at the University of Dayton