At a glance
| Booth | S8143 |
| Country | TW |
| Website | www.iemtw.com/tw |
Company profile
ION ELECTRONIC MATERIALS CO., LTD. develops semiconductor specialty materials with a stated vision of becoming a global leader in specialty gas materials and a trusted partner in advanced manufacturing. The company supports advanced semiconductor processes with critical materials and emphasizes stable, safe and reliable solutions through close collaboration with customers. Its technology and R&D capabilities include ion-implantation gases and high-purity fluorine technologies for semiconductor-material applications. ION ELECTRONIC MATERIALS CO., LTD. strengthens localized R&D and manufacturing as part of a supply-chain strategy intended to improve resilience and support sustainable industry growth. Safety, environmental protection and sustainability are integrated into development activities as part of the company's ESG commitment. Quality management is based on strict traceability and risk-management systems designed to maintain reliability and safety for critical materials. The company states that it supplies leading global semiconductor customers and maintains long-term strategic cooperation with them. Its certifications and compliance framework includes ISO 9001 for quality management, ISO 14001 for environmental management and ISO 45001 for occupational health and safety. The company also holds a Toxic Chemical Substance Permit and a Hazardous Chemical Storage & Operations License, with compliance covering manufacturing, storage, sales and transportation of regulated chemicals. 兆捷科技國際股份有限公司 is headquartered in the Miaoli Tongluo Science Park and focuses on specialty materials for the electronics industry with localized service. Its development capabilities include patents in multiple countries, and its quality-control flow covers IQC supplier review, incoming-material analysis and warehouse management. IPQC uses comprehensive SOPs, precision inspection equipment, defective-product controls and GC laboratory product analysis, while OQC includes full outgoing inspection, customer-satisfaction surveys and continuous improvement. The company operates its own hazardous-material logistics team and hazardous-material bonded factory, supported by a Taiwan customer-service team that is available around the clock and by emergency-response training for rapid on-site support. The company's footprint records establishment in Hsinchu in 2016 Q2, installation of an AsH3 production line in 2017 Q3, and completion of the Hsinchu plant with BF3 and GeF4 production lines in 2018 Q3. It obtained ISO9001 certification in 2018 Q4, recorded stable supply to major domestic semiconductor companies in 2019 Q1, and completed development and patent application for the SAG-II mechanical negative-pressure cylinder. Its customers are mainly semiconductor and optoelectronics manufacturers, and the company states that its products are supplied over the long term to major electronics companies and exported to Japan, Singapore and Korea. The company lists Arsine (AsH3), Phosphine (PH3), 11B Enriched Boron Trifluoride (11BF3), Germanium Tetrafluoride (GeF4), Enriched 72Germanium Tetrafluoride (72GeF4), SAG II versions of 11BF3 and 72GeF4, and Nitrogen Trifluoride (NF3) among its products.
Exhibits
The gas-material offering includes semiconductor negative-pressure cylinder valves, adsorbent filling technologies, ion-implantation gas packaging, patented R&D technologies, specialty-material supply, localized production and hazardous-material logistics services. ION ELECTRONIC MATERIALS CO., LTD. provides localized production of electronic specialty materials to support stable supply and offers negative-pressure cylinder valve and adsorbent development and filling technologies for semiconductor use. Its development team has patents in multiple countries and can meet customized requirements for negative-pressure cylinder packaging and gas filling. Product categories include ion-implantation gases, electronic cleaning gases, laser gases and electronic deposition gases, alongside specialty materials and hazardous-material storage and transportation services. The ion-implantation range includes Arsine (AsH3), Phosphine (PH3), 11B Enriched Boron Trifluoride (11BF3), Germanium Tetrafluoride (GeF4) and Enriched 72Germanium Tetrafluoride (72GeF4). The same range includes 11B Enriched Boron Trifluoride (11BF3) - SAG II and Enriched 72Germanium Tetrafluoride (72GeF4) - SAG II negative-pressure cylinder products. For 11B Enriched Boron Trifluoride (11BF3) - SAG II, the gas can be mixed with hydrogen according to customer requirements and is stored in a high-capacity mechanical negative-pressure system designed for safety and stable flow. The 11BF3 SAG II product is applied in wafer manufacturing and panel industries, uses color-managed cylinders with dedicated gas production lines, and avoids mixed cylinder use to reduce production-line contamination risk. Multiple cylinder sizes and customized filling quantities are available, and the cylinder diameter and valve connection use industry-standard flow specifications so equipment modification is not required. Taiwan filling, regular inventory and immediate shipment support short delivery times, while dedicated transportation and 24-hour service are paired with rapid emergency-response support. For SAG I negative-pressure cylinders, AsH3 is offered in 2.2L/3.6L containers with a 1/2" MVCR valve and 700g/960g supply quantity, while PH3 uses 2.2L/3.6L containers with a 1/2" MVCR valve and 230g/325g supply quantity. SAG I 11BF3 uses a 3.95L container, 1/4" MVCR valve and 280g supply quantity, while GeF4/72GeF4 uses a 2.2L container, 1/4" MVCR valve and 800g supply quantity. For SAG II mechanical negative-pressure cylinders, 11BF3, 11BF3/H2 and 72GeF4/H2 are each listed with a 2.2L container, 1/4" MVCR valve and 525g supply quantity. Enriched 72Germanium Tetrafluoride (72GeF4) - SAG II can likewise be mixed with hydrogen according to customer requirements and uses high-capacity mechanical negative-pressure storage with safety and stable-flow characteristics. The 72GeF4 SAG II product is specified for wafer manufacturing, with color-managed cylinders, dedicated gas production lines, multiple cylinder sizes, customized filling quantities and Taiwan-based inventory for rapid shipment. Its listed SAG I specifications include AsH3 at 2.2L/3.6L and 700g/960g, PH3 at 2.2L/3.6L and 230g/325g, 11BF3 at 3.95L and 280g, and 72GeF4 at 2.2L and 800g, with the corresponding MVCR valve sizes shown for each gas. The SAG II specification lists 11BF3, 11BF3/H2 and 72GeF4/H2 in 2.2L cylinders with 1/4" MVCR valves and 525g supply quantities, together with dedicated transportation and rapid emergency support. Enriched 72Germanium Tetrafluoride (72GeF4) is also offered as a semiconductor ion-implantation specialty gas using adsorbent-type negative-pressure cylinder storage and an adsorbent that has been used in the semiconductor industry for many years. This 72GeF4 product is intended for wafer manufacturing and combines color management, independent gas production lines and valve open-close indication with selectable cylinder sizes and customized filling quantities. Germanium Tetrafluoride (GeF4) is supplied as a semiconductor ion-implantation specialty gas in adsorbent-type negative-pressure cylinder storage and is applied in wafer manufacturing. The GeF4 product uses color management and independent gas production lines, provides valve open-close indication, supports multiple cylinder sizes and customized filling quantities, and is filled in Taiwan with regular inventory for immediate shipment. For both GeF4 and 72GeF4 product pages, dedicated transportation, 24-hour service and rapid emergency-response support accompany the gas and cylinder offerings.
Capabilities and products
- ion implantation gases
- high-purity fluorine technologies
- semiconductor negative-pressure cylinder valve development and filling
- adsorbent material development and filling
- negative-pressure cylinder packaging for ion implantation gases
- electronic cleaning gases
- laser gases
- electronic deposition gases
- Arsine (AsH3) ion implantation gas
- Phosphine (PH3) ion implantation gas
- 11B Enriched Boron Trifluoride (11BF3) ion implantation gas
- Germanium Tetrafluoride (GeF4) ion implantation gas
- Enriched 72Germanium Tetrafluoride (72GeF4) ion implantation gas
- Nitrogen Trifluoride (NF3) supply
- 11BF3 SAG II mechanical negative-pressure cylinder
- 72GeF4 SAG II mechanical negative-pressure cylinder
- custom 11BF3/H2 gas mixing
- custom 72GeF4/H2 gas mixing
- SAG I adsorbent-type negative-pressure cylinder filling
- SAG II mechanical negative-pressure cylinder filling
- multiple cylinder sizes and customized fill quantities
- hazardous-material storage and transportation services
- GC laboratory product analysis