At a glance
| Booth | S7540 |
| Country | JP |
| Website | www.hitachi-tec.com/index.html |
Company profile
Hitachi High-Tech Corporation is a Japan-based company supplying critical-dimension metrology, defect-inspection and dry-etch equipment for advanced semiconductor manufacturing. Its CD-SEM (critical-dimension scanning electron microscope) systems measure fine-pattern dimensions on wafers for process control and yield management, including the GT2000 e-beam metrology system, which uses ultra-low 100 V acceleration voltage and ultra-high-speed multi-point measurement for High-NA EUV processes, and the CG7300 and CS4800 CD-measurement SEMs for EUV-era mass-production metrology. Its GS1000-series electron-beam area defect-inspection systems use beam-shift fast field-of-view scanning and algorithmic inspection for high-speed wafer defect detection. Its conductor dry-etch systems, including the M-8000 and 9000 series, use high-density microwave ECR (electron cyclotron resonance) plasma for hard-mask and silicon etching at 32 nm and beyond. The company is positioned as a supplier of CD-SEM metrology, e-beam defect inspection and ECR dry-etch process equipment.
Capabilities and products
- CD-SEM critical-dimension metrology systems
- CG7300 and CS4800 CD-measurement SEM metrology
- GS1000-series e-beam wafer defect inspection
- GT2000 e-beam metrology for High-NA EUV process control
- algorithmic high-speed wafer defect detection
- hard-mask and silicon etching dry-etch systems
- high-density microwave ECR plasma conductor dry etch