At a glance
| Booth | Q5658 |
| Country | KR |
| Website | www.fstc.co.kr/eng |
Company profile
FST was established in 1987 and succeeded in domestication of pellicle which is protection cover for photo mask used in semiconductor manufacturing procedure. We have been supplying our safe products to renowned semiconductor business to both domestic and overseas customers since 1988 and recently we have completed 6th generation LCD pellicle development and established the mass production system. FST succeeded in chiller development that improves process efficiency by adjusting semiconductor temperature as a result of continuing R&D investment for our own technology in domestication of semiconductor equipment. FST is continuing to do our best to satisfy our customers by providing the qualified product to take upon our mission of becoming “Leader in the industry in 21st century” And we are striving in research with our restless passion and through our technology progress we will combine profitability and growth rate. Recently FST launched optimized EUV Source (EUVO) for EUV infrastructure. EUVO is generated by HHG and it has been used for light source of EUV metrology field. As a major corporation and to materialize social responsibility we commit to raise the fidelity level of contents such as “customer oriented operation, open and aboveboard operation and environment conscientious operation”. AUROS Technology develops leading-edge technologies for wafer inspection & overlay metrology and provides the most competitive and cost-effective solutions to semiconductor. AUROS ' Overlay Metrology System employs advanced optical image-based technology and measures overlay between patterns on stacked layers of semiconductor devices.
Exhibits
Products include pellicles for semiconductor photomasks, sixth-generation LCD pellicles, semiconductor process-temperature chillers, and the EUVO EUV source for EUV metrology. The source also names AUROS wafer inspection and its Overlay Metrology System, which uses optical image-based technology to measure overlay between patterns on stacked layers.
Capabilities and products
- domestication of pellicle for photomask
- 6th generation LCD pellicle mass production
- chiller development improving process efficiency
- optimized EUV Source (EUVO)
- EUVO generated by HHG used as a light source
- AUROS Overlay Metrology System
- wafer inspection and overlay metrology technologies