At a glance
| Booth | L1320 |
| Country | TW |
| Website | www.adnano-tek.com |
Company profile
AdNaNoTek Corporation is the rising leader in ultrahigh vacuum (UHV) technologies and solutions provider in the world. We specialize in the design and manufacture of state-of-the-art and fully customizable UHV systems which fits any research and industrial needs. Our range of products and services includes: UHV Deposition Systems: Pulsed Laser Deposition (PLD), Pulsed-Laser Molecular Beam Epitaxy (PLMBE), Molecular Beam Epitaxy (MBE), Magnetron Sputtering Deposition (Sputter), Electron Beam Evaporator (E-Beam), Ion Beam Sputter Deposition (IBSD), Atomic Layer Deposition Systems (ALD), Reactive Ion Etching (RIE), Chemical Vapor Deposition (CVD), Customized UHV Systems, and Integrated UHV Systems. UHV Components: UHV Linear Tunnel System, Sample/Target Exchanger, Planetary Substrate Manipulator, Customized UHV/HV Chamber, Ion Sources, Sputter Cathodes, SiC Heating System, Electron Beam Heating Systems, and Laser Heating System. Etching Systems: RIE Systems, ICP RIE Systems, ECR RIE Systems, Ion Beam Etching Systems. Our UHV deposition systems are guaranteed to deposit extremely high quality thin films. The state-of-the-art system control software provides user-friendly interface that allows easy operation, precise parameter tuning, real-time process monitoring, and complete data logging. In addition, we also excel in providing high quality customer and technical services, which ranges from in-depth theoretical and hands-on training, professional technology consultation, to technical support. Product pages list a Josephson Junction Electron Beam Evaporator (JEB) Cluster dedicated to creating Josephson junctions for quantum computing devices and applications, thermal evaporator systems, e-beam evaporators for high-k dielectrics (HfO2, ZrO2, Al2O3, Sc2O3), metals (Al, Cu, Ta, Ni, Ag, Au, Ti) and elemental semiconductors (Si, Ge), DC or RF magnetron sputter sources with substrate holders up to 8 inches and substrate temperature up to 800 degrees C, and plasma systems for reactive-ion etching, inductively coupled plasma, electron cyclotron resonance and ion beam etching.
Exhibits
Products and capabilities include EBS and JEB series electron-beam evaporators, DC/RF magnetron sources, PLD (Laser MBE) tools, and dry-etching systems including RIE, ICP-RIE, ECR-RIE, and IBE. It also provides linear vacuum transfer systems, automatic transfer arms, laser substrate heaters, customizable UHV systems, and the four-chamber JEB-4 Josephson-junction deposition system.
Capabilities and products
- design and manufacture of customizable ultrahigh vacuum systems
- pulsed laser deposition PLD systems
- molecular beam epitaxy MBE systems
- atomic layer deposition ALD systems
- ICP and ECR reactive ion etching systems
- Josephson junction electron beam evaporator cluster for quantum devices
- e-beam evaporation of high-k dielectric materials
- magnetron sputter sources for substrates up to 8 inches
- UHV linear tunnel system and sample target exchanger
- control software with real-time process monitoring and data logging
- ion sources and sputter cathodes supply