At a glance
| Booth | I2826 |
| Country | JP |
| Website | www.shincron.co.jp/en |
Company profile
SHINCRON.CO.,LTD. expands the possibilities of vacuum thin films by contributing to the evolution of both deposition and sputtering methods through its technological capabilities. The company states that technological innovation continues and that its role is to meet customer demand at high levels. Alongside technologies for meeting customer requirements, SHINCRON.CO.,LTD. takes on new technologies and provides support so customers can obtain the full performance of its systems. These technological capabilities, new-technology challenges and system-performance support are presented as the company's distinctive strengths.
Exhibits
The vacuum thin-film lineup provides functions for adjusting optical intensity, wavelength and optical paths, and for separating and synthesizing polarization components. For electronics and electricity, thin films can support electrical conduction, high-frequency signal transmission and transparency that allows light to pass through. Surface-control functions can make thin-film surfaces hydrophilic or water-repellent and can provide corrosion or abrasion resistance. Color-control functions can express colors that add high-quality appearances and can realize functions that allow radio waves to pass through metals. SHINCRON.CO.,LTD. also presents vacuum thin-film technologies as a basis for creating additional technologies beyond the named optical, electrical, surface and color functions. MIC is listed as a Universal deposition system for optics and color control. EPD is a System for dielectric super multilayer films, while CES is a Continuous deposition system, both listed for optics applications. VISION is a System for spectacle lens antireflection films, and ARC is a Batch type deposition system for resins. RAS is a Load lock type sputtering system for dielectric multilayer films covering optics, surface control and color control applications. PMC is a Load lock type deposition system for metallic films, SLS is a Load lock type sputtering system for dielectric multilayer films, and SIC is a Batch type deposition system for metals. CSS is a Sputtering system for dielectric thin films, and BSC is a Sputtering system for transparent and metallic electrodes. BMS is a Sputtering system for mold release films, and ACE is a Batch type deposition system for AFS (Anti-Fingerprint and Scratch) used for surface control. RAS-2200 is a Sputtering system for large substrates with surface-control and color-control applications. INACO is a cluster type single wafer sputtering system application for electron and electricity control. SCP-BT is a cluster type RAS method-based film sputtering system for the semiconductor and electronic markets. The component category also lists OPM, an RF ion source, Essential Macleod and Macleod. Thin films support automobile applications associated with autonomous driving and sensor technologies. Optical thin-film technologies are used for spectacles and AR/VR devices. Smartphones use thin-film technologies from the surface to the inside for communication, authentication and anti-fouling functions. Film-deposition technologies are used for electronic components such as optical semiconductors and high-frequency devices. SHINCRON.CO.,LTD. systems are used in medical care and biotechnology fields where higher safety and accuracy are required. Film-deposition technologies are used as key technologies for next-generation energy applications including fuel cells and photovoltaic cells. Thin-film technologies are used not only for lenses but also for image sensors, substrates and displays. The technologies are also used for lenses, LD/LED light sources and filters that separate and synthesize colors. For mobile communication, RF filters use Surface Acoustic Waves (SAWs) and Bulk Acoustic Waves (BAWs) for transmitting and receiving radio waves. SAW filters use comb-shaped IDT electrodes formed on piezoelectric substrate surfaces and form RF-filter bandwidths through the resonance characteristics of surface acoustic waves excited by the IDTs. BAW filters place a piezoelectric body between upper and lower electrodes, use thickness extensional vibrations, and can be classified into FBARs and SMRs. Metallic electrode films can be formed according to material type and characteristics, with Au, Al, Cu and Ti used as pad electrodes for passive or active elements and wiring contact resistance minimized. ITO transparent conductive films combine electrical conduction with light transparency and are used for static-discharge prevention, touch-screen transparent electrodes, next-generation photovoltaic-cell transparent electrodes and transparent heaters that prevent dew condensation and snow accretion. The transparent-electrode examples list Sample 1 and Sample 2 with resistance values of 2.03 and 24.7 Ω, sheet resistance values of 9.09 and 110.61 Ω/□, film thicknesses of 145.9 and 16.4 nm, and specific resistance values of 1.33E-04 and 1.81E-04 Ω・cm. For next-generation energy, thin-film technology is presented as important to further fuel-cell performance and all-solid-state batteries, with SHINCRON.CO.,LTD. offering solutions from material search through mass production.
Capabilities and products
- deposition systems for dielectric super-multilayer films
- continuous optical deposition systems
- spectacle-lens antireflection-film deposition systems
- load-lock sputtering systems for dielectric multilayer films
- load-lock deposition systems for metallic films
- sputtering systems for transparent and metallic electrodes
- sputtering systems for mold-release films
- batch deposition systems for AFS anti-fingerprint and scratch films
- sputtering systems for large substrates
- cluster-type single-wafer sputtering systems
- cluster-type RAS thin-film sputtering systems for semiconductor applications