基本資料
| 攤位 | T9062 |
| 國別 | JP |
| 產品分類 | Cleaning; Washing Equipment for Assembly & Packaging · Chemical Mechanical Polishing (CMP); Electro Polishing, Mechanical Polishing Equipment · Cleaning; Washing; Drying Equipment for Substrate, Fab Processing · Deposition; Physical Vapor (PVD); Sputtering; Evaporation Equipment · Etching; Stripping; Ashing - Dry and Wet Equipment · Cleaning Chemicals; Solvents; Strippers · Other Specialty Chemicals · Surface protection material; coatings · Dopant Gases · Other Specialty; Mixed Gas · Pure & Bulk Gases · Rare; Noble Gases · Materials, Nanotechnology · CMP; Grind; Lap; Polish; Abrasive materials · Deposition Supplies · Deposition/Target Materials · Filters for Liquid; Oil · Filters, Getters, Purifiers, Catalysts for Gases · Gas; Liquid delivery panels as subsystems · Gas and Other Generation Systems · Gas Handling - Cabinets; Control; Supply Systems · Gas Monitoring Equipment; RGA's; TGO compliance · Clean Rooms · Contamination Control; HEPA Filtering Systems · Deposition Service · Clean Room; Contamination Control · Distribution and Logistics |
| 網站 | www.ueki.co.jp |
公司簡介
憑藉超過 90 年的經驗，Ueki Corporation 為日本市場的各類工業領域供應氣體與氣體工程服務。特別是在半導體產業，Ueki 透過遍及全日本的 26 個業務據點，與市場上的主要晶圓代工廠與記憶體製造商往來。除了氣體之外，我們也供應冷卻液與清洗化學品，以及材料，例如用於日本半導體製造製程的濺鍍靶材。
能力與產品項目
- 工業氣體供應
- 半導體用高純度氣體供應
- LCD 用高純度氣體供應
- 高純度氣體供應設備
- 高純度氣體配管施工
- 清洗化學品供應
- 冷卻液供應
- 濺鍍靶材供應
- 氣體供應設備工程
- 藥品供應設備工程