ProSpectral Ltd

Exhibitor at SEMICON Taiwan 2026 · Booth I3000

Booth I3000Country GB3 product topics
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BoothI3000
CountryGB
Websitewww.prospectral.tech
Exhibitor profile

Company profile

ProSpectral Ltd is an innovation-led photonics company developing next-generation snapshot spectral imagers for materials identification using computer vision. Its technology uses off-the-shelf image sensors modified with intelligently designed nanostructured filters. These thin material layers, described as hundreds of nanometres thick, can be coated and patterned with standard semiconductor-industry processes including thin-film deposition, lithography and etching. ProSpectral Ltd designs pattern blueprints for these layers so they interact with or scatter light before it reaches the sensor beneath, and the patterned layers act as specialized optical filters for extracting information used in materials fingerprinting. The design process can support a generalized spectral-imaging camera or can be tuned to collect only the light needed for a particular use case, enabling application-specific cameras that reduce noise and improve data accuracy. The company states that its imaging-sensor technology enables less complex and less expensive cameras while improving manufacturability, form factor, data quality and robustness. ProSpectral Ltd is seeking collaboration with partners experienced in scaling laboratory nanofabrication to pilot lines, image-sensor manufacturers, especially visible and short-wave-infrared sensor manufacturers, and camera manufacturers. Its team presentation describes research experience spanning metasurface-mediated sensing, optical design, semiconductor manufacturing and computer vision.

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The offering centers on next-generation snapshot spectral imagers for materials identification using computer vision, a capability also stated directly in the company’s concise product description. The company also presents multimodal imaging for the next generation of computer vision as part of its technology direction. Its nanostructured optical-filter and sensor approach can be tuned through the design process to collect only the light needed for particular use cases, enabling targeted application-specific cameras with lower noise and improved data accuracy. The nanostructured filter layers can be coated and patterned using standard semiconductor-industry processes, including thin-film deposition, lithography and etching, linking the optical-filter architecture directly to semiconductor-compatible fabrication steps. The nanostructured filters are identified separately as intelligently designed nanostructured filters, reinforcing the filter layer as a central element of the imaging architecture. By controlling how light interacts with or scatters from the patterned layer before collection by the image sensor, the design acts as a specialized optical filter that extracts information required for materials fingerprinting. The same design flexibility allows a general spectral-imaging implementation or a use-case-specific configuration, so the camera architecture can be tailored to the information needed for a defined materials-identification task.

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