Omni Matcher · SEMICON Taiwan 2026 · Exhibitor List

Advanced Echem Materials Company Limited

Exhibitor at SEMICON Taiwan 2026 · Booth S7142

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At a glance

BoothS7142
CountryTW
Websitewww.aemc.com.tw

Company profile

The Lift-Off photo resists (Lift-Off PR) are negative type and need post-exposure baking process. One of major applications of the Lift-Off PR is used for PMOLED manufacturing process. The negative type of color photo resists (CPR) can be used for color filter (CF). The application of CPR on CF substrate is from G2.0 to G8.5 and they also can be utilized for slit, slit/spin or spin coating processes. In addition, the chromaticity of CPR can be designed by requirement. Red, Green, Blue and other colors are available.

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